Development of Textured ZnO Thin Films for Solar Cells Front Contact applications using Sputtering Technique and the demonstration of its performance in Silicon Thin Film Solar Cells

Subcategory (under Clean Energy): Solar (PV)
Technology Readiness Level (TRL): TRL 6 - TRL 7 - Pre-commercial Demonstration
Technology Outline (Process Description)

The primary objective of the activity is the development of a cost effective front contact transparent conductive oxide (TCO) coating – Aluminium doped Zinc Oxide (AZO) on glass substrates of size 1.1 m x 1.4 m (GEN 5.5) using magnetron sputtering, for solar cell applications. AZO is chosen as the transparent conductive electrode for silicon based thin film solar cells due to its high electrical conductivity and optical transparency in the visible and the NIR region. Also, the fact that AZO is considerably cheaper and abundant as compared to Indium Tin Oxide (ITO), and is more stable in hydrogen plasma as compared to Fluorine doped Tin Oxide (FTO) tilts the balance in its favour. Another aspect is the ease with which AZO can be textured both by chemical means, and by plasma treatment, for light trapping, which is important for solar cell applications.

Salient Features/Advantage

  • Holistic development of indigenous hardware, and process technology for large area glass deposition, and texturization.
  • Frameless glass holding for Edge- to-Edge coating of glass
  • Rotary Magnetron based sputter cathodes enabling high target utilization and high throughput for cost- effective production.
  • Modular system design enabling easy upscaling.

Key Outcomes

  • AZO films having a sheet resistance of < 10 ohms/square with an average transmission of ~ 84 – 90 % (glass compensated value) in the visible range over 1.1 x 1.4 m glass.
  • Surface texture that is suitable for the fabrication of amorphous silicon solar cells.
  • Comparable solar cell performance is obtained on the in-house developed substrates when compared to the commercially procured substrates.

IP Protection details

  • Patent filed (Title, national/International): Nil
  • Patents Granted: Nil
  • Copyrights obtained /progress on commercialisation /Pl. specify connect with industry: We are working on providing solutions for large area TCO requirements from different companies for EMI shielding and heating applications.

Contact details (for more information)

Supporting Photographs/Images

Organizations involved in the development (logo/name)

Hind High Vacuum Company Private Limited Site No. 17, Phase 1, Peenya Industrial Area, Bengaluru – 560058, India

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